首页> 外文会议>2014 7th International Silicon‐Germanium Technology and Device Meeting >Weak anti-localization behavior of high mobility 2D hole gas in a strained Ge QW heterostructure
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Weak anti-localization behavior of high mobility 2D hole gas in a strained Ge QW heterostructure

机译:Ge QW异质结构中高迁移率二维空穴气体的弱抗局域行为

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摘要

In summary we have measured the low temperature and low field MR of a high mobility Ge 2DHG. The resulting MR curves demonstrate WL-like behavior at temperatures below 2K with WAL-like behavior appearing between 3K and 12K. Evidence of WAL has not been previously observed in Ge. We believe this transition to be the result of a summation of WL and WAL effects in the main conduction channel and parallel conduction channel(s).This is a promising result for Ge as a possible channel for future spin-FETs.
机译:总之,我们已经测量了高迁移率Ge 2DHG的低温和低场MR。所得的MR曲线表明,温度低于2K时WL行为,而3K到12K之间出现WAL行为。以前从未在Ge中观察到WAL的证据。我们认为这种转变是主传导通道和并联传导通道中WL和WAL效应加总的结果,对于Ge作为未来自旋FET的可能通道而言,这是一个有希望的结果。

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