New Nano-patterns Generated by the Self- Assembling of PS Spheres During ICP Etching

摘要

Polystyrene sphere is widely used as mask for wet-chemical or dry-plasma etching.During our inductively coupled plasma etching of silicon (100) surface to fabricate honeycomb structure,some self-assemble phenomena of the polystyrene sphere have appeared and new glam patterns have been observed under appropriate process.For the close-packed polystyrene spheres,a polystyrene membrane with highly ordered periodic regular triangle pores is obtained.And for the scattering polystyrene spheres,every polystyrene sphere have transformed to 3-5 “side-by-side goldfishes”.The affects of the flow of C4F8 on the patterns achieved have been investigated,and it is concluded that gas flow is a very important factor that affect the patterns generated by the self-assembling of the polystyrene spheres during etching process.The etching recipe reported here provides a technology to fabricate large area highly ordered polystyrene membranes with regular triangle or square pores.These membranes can be used as masks to fabricate triangular or square arrays of nano-pillars or nano-pores by wet-chemical or dry-plasma etching technologies.