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PHOTOSENSITIVE RESIST INK AND MANUFACTURE OF PS PLATE BY USING IT AND METHOD FOR ETCHING THIS PS PLATE
PHOTOSENSITIVE RESIST INK AND MANUFACTURE OF PS PLATE BY USING IT AND METHOD FOR ETCHING THIS PS PLATE
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机译:PS板的光敏抗蚀剂油墨及其制造方法和刻蚀该PS板的方法
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摘要
PURPOSE:To enhance resolution by incorporating a photoresist contg. a photosensitive agent, and a resin to be solubilized or insolubilized in a developing soln. by exposure in the presence of a photosensitive agent, or a photoresist contg. a photosensitive resin, and a body pigment. CONSTITUTION:The photosensitive resist ink contains the photosensitive agent and a resin to be solubilized or insolubilized in a developing soln. by exposure in the presence of the photosensitive agent or a photoresist contg. a photosensitive resin and a body pigment. The surface of a base having at least metallic surface at other surface is coated with this ink by the screen printing process. The ratio of the photosensitive agent to the resist resin in the photoresist is (5-50):100wt. and in the case of using the photoresist to be developed with an alkaline developing soln., its ratio is (10-30):100, thus permitting a photosensitive resist ink adapted to the screen printing process to be obtained and the ink layer of the PS plate to be made uniform in thickness and superior in resolution.
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