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Electronic structure of Ge/SixSnyGe1#x2212;x#x2212;y quantum dots

机译:Ge / SixSnyGe1-x-y量子点的电子结构

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The electronic band structures and optical gains of Ge/SixSnyGe1−x−y truncated pyramid-shaped quantum dots (QDs) are calculated using the 8-band k.p model. The large bowing factors in the calculation of band gaps of both Ã-conduction and L-conduction valley in the barrier are considered so that the band gaps of the barrier are small. The strains are calculated by constant strain method and valence force field (VFF) method. By constant strain method, strains are uniformly distributed in the QD, and there is no strain in the barrier. Due to the small conduction band offset and strong quantum confinement effect, it requires greater tensile strain to make Ge QD a direct-band material by setting Si and Sn compositions at 11% and 26% respectively. By VFF method which considers the four nearest-neighbour interactions for each atom, the calculated strains are not uniform and the strains exist in the barrier. These barrier strains have raised the valence band edge of the barrier and changed the potential profile of the structure, so that the holes may not be confined in the QD. The VFF method should be more accurate to reflect the real situation.
机译:Ge / Si x Sn y Ge 1-x-y 的电子能带结构和光学增益被截断的金字塔形量子点(QDs)使用8频段kp模型进行计算。在计算势垒中的γ传导和L传导谷的带隙时,考虑到较大的弯曲因子,因此,势垒的带隙较小。通过恒定应变法和价价场(VFF)方法计算应变。通过恒定应变法,应变在QD中均匀分布,并且势垒中没有应变。由于较小的导带偏移和强的量子限制效应,通过将Si和Sn的成分分别设置为11%和26%,需要更大的拉伸应变才能使Ge QD成为直接带材料。通过考虑每个原子的四个最近邻相互作用的VFF方法,计算出的应变不均匀,并且该应变存在于势垒中。这些势垒应变提高了势垒的价带边缘,并改变了结构的电势分布,因此孔可能不会限制在QD中。 VFF方法应更准确以反映实际情况。

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