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A Region-Based Framework for Design Feature Identification of Systematic Process Variations

机译:基于区域的系统过程变异设计特征识别框架

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Process monitoring circuitry such as ring oscillators or delay-test-based diagnosis method has been applied to characterize process variations of a chip. For a design process, it is also desirable to consider circuit features that might cause such a systematic process variation. In this paper, we use the variation map built from measured excessive delays to analyze the correlation between circuits and systematic variations. With support vector regression, a physical map of a circuit is partitioned into different regions that are inherently affected by similar causes. And then possible features (e.g., cell types, layout characteristics, etc.) that influences these regions are ranked. Experimental results show that the proposed method can effectively identify process regions and rank major features at top orders with injected variations.
机译:诸如环形振荡器或基于延迟测试的诊断方法之类的过程监控电路已应用于表征芯片的过程变化。对于设计过程,还需要考虑可能导致这种系统过程变化的电路特征。在本文中,我们使用从测量到的过度延迟构建的变化图来分析电路与系统变化之间的相关性。通过支持向量回归,电路的物理图被分为不同的区域,这些区域固有地受到类似原因的影响。然后,对影响这些区域的可能特征(例如,单元类型,布局特征等)进行排序。实验结果表明,所提出的方法可以有效地识别过程区域,并在注入变化的情况下对主要特征进行高阶排序。

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