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Effect of interfacial states on the technological variability of trigate MOSFETs

机译:界面态对三栅MOSFET技术可变性的影响

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摘要

This work studies the influence of the interfacial states on the performance of Trigate MOSFETs and, specifically, on the Subthreshold Swing (SS) and threshold voltage (VT) variability. To do so, a solver for the 2D Schrödinger-Poisson coupled equation system has been developed, including the effects of interfacial states (Dit). Different Dit(E) profiles have been considered, analyzing their influence for several device geometries.
机译:这项工作研究了界面状态对Trigate MOSFET性能的影响,尤其是对亚阈值摆幅(SS)和阈值电压(VT)的可变性的影响。为此,已经开发了二维Schrödinger-Poisson耦合方程系统的求解器,其中包括界面态(Dit)的影响。考虑了不同的Dit(E)配置文件,分析了它们对几种设备几何形状的影响。

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