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Numerical investigation of negative refraction effect in two-dimensional photonic crystal fabricated in gallium nitride

机译:氮化镓制备的二维光子晶体负折射效应的数值研究

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We investigated the conditions for obtaining negative refraction in photonic crystals fabricated in gallium nitride (GaN). Negative refraction at the interface between air and two-dimensional photonic crystals was numerically analyzed using Plane Wave Expansion Method (PWE) and Finite Difference Time Domain Method (FDTD). To describe the origin of negative refraction we have carried out simulations of equifrequency surfaces (EFS) of each photonic crystal structure. The presence of negative effective refractive index has been shown in two dimensional photonic crystal with hexagonal lattice of air holes etched in GaN. We have also observed all-angle negative refraction without existence of negative refractive index for 2D photonic crystal with square lattice of air holes. Additionally, the superlensing effect as a potential application of negative refraction in two dimensional photonic crystal was simulated.
机译:我们研究了在氮化镓(GaN)中制造的光子晶体中获得负折射的条件。使用平面波展开法(PWE)和时域有限差分法(FDTD)对空气和二维光子晶体之间的界面处的负折射进行了数值分析。为了描述负折射的起源,我们已经对每个光子晶体结构的等频表面(EFS)进行了模拟。在二维光子晶体中已经显示出负有效折射率的存在,该二维光子晶体具有在GaN中蚀刻的气孔的六角形晶格。我们还观察到具有气孔方阵的二维光子晶体不存在负折射率的全角度负折射。另外,还模拟了超透镜效应作为二维光子晶体中负折射的潜在应用。

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