Photostructurization of Layers from Carbazolylalkylmetacrylate Copolymers for New Photoresist Media Development

摘要

We studied thin films of carbazolylalkylmethacrylates (CAMC) copolymers with octylmelhacrylates (OMA) prepared by a method of radical polymerization in toluene solution. They contain about of 60 mol.% of carbazolyl links. With the purpose of improving the photographic characteristics, we studied photopolymer layers elaborated from carbazoie-containing compositions with cross-linking agents capable to cause the photostructurization. The experimental results have shown that the resolution of the holographic films based on CAMC:OMA polymeric layers is no less than 2000 lines/mm. The maximum diffraction efficiency (DE) value of recorded holograms is 1.5% at the layer thickness of 5-6 μm, A subsequent chemical treatment permits to increase the DE up to 20%. DE values of gratings recorded in carbazole-containing copolymers with 4-10% of cross-linking agents and 1-2% of ClAn were increases up to 23% at the exposure duration of 8 min.