One-dimensional carbon materials in both tubular and wire forms were grown using a microwave plasma enhanced chemical vapor deposition technique. Three types of catalysts, including sputter deposited nickels thin films, amorphous TiNi thin films, and amorphous CoFeZrB thin films were used as the catalyst. In the case of Ni thin films, carbon nanowires were obtained. In case of amorphous TiNi thin film catalyst, there was no growth of CNTs due to the crystallization of the catalyst. In case of amorphous CoFeZrB thin film catalyst, CNT with various inner and outer diameters were obtained, depending on the characteristics of the catalyst.
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