A silicon compound, a reactive material, a resin composition, a photosensitive resin composition, a cured film, the manufacturing method of a cured film, a pattern cured film, and the manufacturing method of a pattern cured film

摘要

The silicon compound represented by the following general formula (x). Moreover, the reactive material containing the silicon compound represented by the following general formula (x). In general formula (x), when there is a plurality of R 1 , each independently represents a linear, branched or C3-10 cyclic alkyl group having 1 to 10 carbon atoms, or a straight chain having 2 to 10 carbon atoms. It is a chain|strand, C3-C10 branched or C3-C10 cyclic alkenyl group, All or part of the hydrogen atom in an alkyl group or an alkenyl group may be substituted by the fluorine atom, R When there are two or more each independently a linear or branched alkyl group having 1 to 4 carbon atoms, wherein all or part of the hydrogen atoms in the alkyl group may be substituted with fluorine atoms, R A is an acid labile group, a is an integer from 1 to 3, b is an integer from 0 to 2, c is an integer from 1 to 3, a+b+c=4, and n is an integer from 1 to 5.