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Method for measuring optical constant of thin film of fluorine-containing organosilicon compound

机译:含氟有机硅化合物薄膜光学常数的测量方法

摘要

The optical constant (refractive index n, extinction coefficient κ) of a thin film of a fluorine-containing organosilicon compound having a small surface roughness or haze value and having a homogeneous surface can be directly measured with high precision and with good reproducibility by the ellipsometry method. provision of methods. As the surface roughness, a thin film of a fluorine-containing organosilicon compound having an arithmetic mean roughness of less than 1.0 nm, a root mean square roughness of less than 2.0 nm, a haze value of less than 0.3, and a film thickness of 3 to 10 nm is disposed on a substrate A method for measuring the optical constant of a thin film of a fluorine-containing organosilicon compound, comprising the steps of: forming; and measuring, by ellipsometry, the optical constant of the thin film formed on the substrate.
机译:具有较小表面粗糙度或雾度值且具有均匀表面的含氟有机硅化合物薄膜的光学常数(折射率n、消光系数κ)可通过椭偏法以高精度和良好再现性直接测量。提供方法。作为表面粗糙度,将算术平均粗糙度小于1.0 nm、均方根粗糙度小于2.0 nm、雾度值小于0.3且膜厚度为3至10 nm的含氟有机硅化合物薄膜布置在衬底上,这是一种测量含氟有机硅化合物薄膜光学常数的方法,包括以下步骤:形成;以及通过椭偏仪测量在衬底上形成的薄膜的光学常数。

著录项

  • 公开/公告号KR20220044773A

    专利类型

  • 公开/公告日2022-04-11

    原文格式PDF

  • 申请/专利号KR20227007193

  • 发明设计人 우치다 다카시;

    申请日2020-07-30

  • 分类号G01N21/41;C08G65/336;C09D171;G01J4/04;G01N21/21;G01N21/84;G02B1/18;

  • 国家 KR

  • 入库时间 2024-06-14 22:59:35

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