Model-based dynamic position correction for digital lithography tools

摘要

The present disclosure generally relates to photolithography systems and methods for correcting position errors in photolithography systems. When the photolithography system is first started, the system enters a stabilization period. During the stabilization period, position readings and data such as temperature, pressure, and humidity data are collected as the system prints or exposes the substrate. A model is created based on the collected data and location readings. The model is then used to estimate the error in subsequent stabilization periods and the estimated error is dynamically corrected during the subsequent stabilization period. [Selection diagram] FIG. 5