Model-Based Dynamic Position Correction for Digital Lithography Tools

摘要

The present disclosure relates generally to photolithography systems, and methods for correcting position errors in photolithography systems. When the photolithography system is first started up, the system enters a stabilization period. During the stabilization period, position readings and data, such as temperature, pressure and humidity data, are collected when the system prints or exposes a substrate. A model is created based on the collected data and position readings. The model is then used to estimate errors in subsequent stabilization periods, and the estimated errors are dynamically corrected during subsequent stabilization periods.