首页> 外国专利> LASER INTERFERENCE FRINGE CONTROL FOR HIGHER EUV LIGHT SOURCE AND EUV THROUGHPUT

LASER INTERFERENCE FRINGE CONTROL FOR HIGHER EUV LIGHT SOURCE AND EUV THROUGHPUT

机译:激光干涉条纹控制,用于更高的EUV光源和EUV吞吐量

摘要

A method for generating an extreme ultraviolet (EUV) radiation includes simultaneously irradiating two or more target droplets with laser light in an EUV radiation source apparatus to produce EUV radiation and collecting and directing the EUV radiation produced from the two or more target droplet by an imaging mirror.
机译:一种用于产生极端紫外线(EUV)辐射的方法包括在EUV辐射源装置中同时用激光照射两个或更多个靶液滴,以产生EUV辐射并通过成像产生由两个或更多个目标液滴产生的EUV辐射 镜子。

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