Residual gas analyser and EUV lithography system with a residual gas analyser

摘要

The invention relates to a residual gas analyzer (40) for the analysis of a residual gas (30),in particular a residual gas (30) in an EUV lithography system (1),Comprising: an inlet system (41) for the inlet of residual gas (30) from a vacuum environment (27a) into the residual gas analyser (40),and a mass analyser (43),comprising a detector (44) for the detection of ionized constituents (30a) of the residual gas (30). The residual gas analyser (40) comprises an ion transfer device (42) for transferring the ionized components (30a) of the residual gas (30) to the mass analyser (43),wherein the ion transfer device (42) comprises an ion filter device (45) which is designed for filtering at least one ionic component (30a) of the residual gas (30). The invention also relates to an EUV lithography system, in particular an EUV lithography system comprising: at least one residual gas analyzer (40),which is designed as described above for the analysis of a residual gas (30) in a vacuum environment (27a) of the EUV lithography system (1).