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NANOIMPRINT LITHOGRAPHY PROCESS USING LOW SURFACE ENERGY MASK
NANOIMPRINT LITHOGRAPHY PROCESS USING LOW SURFACE ENERGY MASK
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机译:纳米压印光刻工艺使用低表面能量掩模
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摘要
A method is described for creating a modified mask with low surface energies for a nano-imprint lithography (NIL) imprinting process. The method includes applying a master mold to an imprint mask material to create an imprint mask. The method further includes modifying the imprint mask by applying a treatment to the imprint mask to cause a surface energy level of the imprint mask to fall below a sticking threshold. The modified imprint mask is applied to a nano-imprint lithography (NIL) material to create an imprinted NIL material layer. The surface energy level of the imprint mask causes a shape of the imprinted NIL material layer to be remain unchanged when the imprinted NIL material layer is detached from the modified imprint mask.
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