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METHOD FOR PRODUCING A PHYSICAL VAPOR DEPOSITION (PVD) TARGET FOR CRTAN COATINGS AND CRTA TARGET OBTAINED THEREBY
METHOD FOR PRODUCING A PHYSICAL VAPOR DEPOSITION (PVD) TARGET FOR CRTAN COATINGS AND CRTA TARGET OBTAINED THEREBY
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机译:制造Cr明天涂层的物理气相沉积(PVD)靶标的方法和由此获得的CRTA靶标
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摘要
A process for producing a hard material layer on a substrate. A multilayer coating system is applied to the substrate by alternate deposition of CrTaN and AlTiN by way of physical vapor deposition (PVD). The CrTaN and/or the AlTiN are preferably deposited from a composite target.
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