首页> 外国专利> A method for producing a transparent conductive oxide thin film, an oxide thin film using the method and a electronic device using the film

A method for producing a transparent conductive oxide thin film, an oxide thin film using the method and a electronic device using the film

机译:一种用于制造透明导电氧化物薄膜的方法,使用该方法的氧化物薄膜和使用薄膜的电子器件

摘要

The present invention relates to a method for manufacturing a transparent conductive oxide (TCO) having high conductivity through a low-cost process by forming a thin film on a substrate using a simple hydrothermal synthesis method at a low temperature, and the transparent conductive oxide manufactured thereby It relates to a thin film and an electronic device including the same. According to the present invention, by manufacturing a high-conductivity thin film in a relatively simple process using a low-cost precursor solution, it is possible to significantly reduce manufacturing cost and manufacturing time, thereby greatly improving productivity.
机译:本发明涉及通过在低温下使用简单的水热合成方法在基板上形成薄膜,制造具有高导电性的透明导电氧化物(TCO)的方法,并在低温下在基板上形成薄膜,并制造透明导电氧化物 因此,它涉及一种薄膜和包括该薄膜和电子设备。 根据本发明,通过使用低成本前体溶液在相对简单的过程中制造高导率薄膜,可以显着降低制造成本和生产时间,从而大大提高了生产率。

著录项

  • 公开/公告号KR102340587B1

    专利类型

  • 公开/公告日2021-12-21

    原文格式PDF

  • 申请/专利权人

    申请/专利号KR1020190069432

  • 发明设计人 최운섭;

    申请日2019-06-12

  • 分类号C23C18/12;C23C18/04;H01B1/02;H01B1/08;

  • 国家 KR

  • 入库时间 2022-08-24 22:56:23

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