首页> 外国专利> METHOD FOR CALIBRATING A DEVICE FOR MEASURING A PROCESS VALUE OF AT LEAST ONE SUBSTANCE, METHOD FOR MEASURING A PROCESS VALUE OF AT LEAST ONE SUBSTANCE BY MEANS OF A DEVICE AND SYSTEM

METHOD FOR CALIBRATING A DEVICE FOR MEASURING A PROCESS VALUE OF AT LEAST ONE SUBSTANCE, METHOD FOR MEASURING A PROCESS VALUE OF AT LEAST ONE SUBSTANCE BY MEANS OF A DEVICE AND SYSTEM

机译:用于校准用于测量至少一种物质的过程值的装置的方法,通过装置和系统测量至少一种物质的过程值的方法

摘要

The invention relates to a method for calibrating a device (1) for measuring a process value (PW) of at least one substance (ST), the device (1) having a detector device (2), the detector device (2) measuring a detector value (DW) by means of detecting at least gamma rays (GR), the gamma rays (GR) having at least partially penetrated at least the substance (ST) and thereby scattering, and generating the detector value (DW) based on the detected gamma rays (GR) is designed, - the method comprising the step of: calculating a calibration assignment (KT) at least by simulating the penetration and thereby modeling the scattering (SC) of the gamma rays (GR), the calibration assignment (KT) each having a detector value (DW) for different process values (PW) assigns.
机译:本发明涉及一种用于校准用于测量至少一个物质(ST)的过程值(PW)的装置(1),所述装置(1)具有检测器装置(2),检测器装置(2)测量 通过检测至少伽马射线(GR)的检测器值(DW),所述伽马射线(GR)至少部分地穿过物质(ST),从而散射,并基于所述散射,并产生所述检测器值(DW) 设计了检测到的伽马射线(GR) - 该方法包括以下步骤:至少通过模拟凝血射线(GR)的散射(SC)来计算校准分配(KT),从而计算伽马射线(GR)的散射(SC),校准分配 (kt)每个具有用于不同处理值(PW)分配的检测器值(DW)。

著录项

  • 公开/公告号EP3922962A1

    专利类型

  • 公开/公告日2021-12-15

    原文格式PDF

  • 申请/专利权人 BERTHOLD TECHNOLOGIES GMBH & CO. KG;

    申请/专利号EP20200179377

  • 发明设计人 MÜLLER DR. STEFFEN;

    申请日2020-06-10

  • 分类号G01F23/288;G01F25;G01N9/24;

  • 国家 EP

  • 入库时间 2024-06-14 22:31:53

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