Dielectric window plasma processing system comprising the window and method for fabricating semiconductor device using the system

摘要

The technical idea of the present invention is to provide a dielectric window capable of uniform distribution of plasma density in a plasma process, a plasma process system including the window, and a semiconductor device manufacturing method using the system. The dielectric window is formed of a first dielectric material, and has a first surface facing the inside of the plasma chamber and a second surface opposite to the first surface, and a groove for controlling a magnetic field is formed on the second surface.