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Pure copper powder having Si film, manufacturing method thereof, and laminated sculpture using the pure copper powder

机译:具有Si膜的纯铜粉末,其制造方法和使用纯铜粉的层压雕塑

摘要

Pure copper powder having a Si film formed thereon, wherein the Si adhesion amount is 5 wtppm or more and 200 wtppm or less, the C adhesion amount is 15 wtppm or more, and the weight ratio C/Si is 3 or less. The present invention suppresses partial sintering due to preheating of pure copper powder in lamination molding by the electron beam (EB) method, and suppresses a decrease in the vacuum degree during molding due to carbon (C) during molding. An object of the present invention is to provide a pure copper powder having a Si film formed thereon, a method for producing the same, and a laminated article using the pure copper powder.
机译:在其上形成纯铜粉末,其中Si粘合量为5wtppm以上,200wtppm或更低,C粘附量为15wtppm或更大,重量比c / si为3或更低。 本发明抑制了通过电子束(EB)方法在层压模塑中预热的纯铜粉末的部分烧结,并且在模制期间由于碳(C)而抑制成型期间的真空度降低。 本发明的一个目的是提供一种纯铜粉末,其上形成了Si膜,其制造方法和使用纯铜粉末的层压制品。

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