A polymer, a resist composition containing the polymer, a method for manufacturing a member using the same, a method for forming a pattern, and a method for forming an inverted pattern

摘要

In patterning formed by irradiation of particle beams or electromagnetic waves with high particle and photon energy, the decrease in sensitivity and deterioration of pattern roughness caused by a decrease in energy imparting density are alleviated, so that absorption efficiency is high, sensitivity, resolution, and a polymer used in a resist composition having excellent pattern performance characteristics, a resist composition containing the polymer, and a method for manufacturing a member using the same. Unit A having an onium salt structure that simultaneously generates radicals and acids in addition to the polarity change caused by being decomposed from ionic to non-ionic by being decomposed by irradiation with particle beams or electromagnetic waves, and Unit B having a structure bonded by acid catalysis A polymer containing The unit B is preferably a unit in which a compound represented by the following general formula (I) or (II) is bonded to an Sp group of the following formula (1) at any position in the compound. [Formula 1]