METROLOGY METHOD COMPUTER PRODUCT AND SYSTEM

摘要

A method comprising: determining a type of structural asymmetry of a target from a measured value of the target; and performing a simulation of an optical measurement of the target to determine a value of an asymmetry parameter associated with the type of asymmetry. performing a simulation of an optical measurement of the target to determine a value of an asymmetry parameter associated with a type of structural asymmetry of the target determined from the measured value of the target, and the change in target formation parameter associated with the target. A method comprising analyzing the sensitivity of the asymmetry parameter. determining a structural asymmetry parameter of the target using measured parameters of radiation diffracted by the target, and measuring the target based on the structural asymmetry parameter that is least sensitive to changes in target formation parameters associated with the target. A method comprising determining a characteristic of the beam.