Method for Fault Detection and Fault Diagnosis in Semiconductor Manufacturing Process

摘要

The present embodiments generate residual data by removing data restored through a restoration model from the collected time series data, generate denoise residual data by removing sensor noise from the residual data, and analyze the denoise residual data to detect failure. By classifying, there is provided a failure detection and classification device capable of visualizing the time of occurrence of an abnormal pattern that causes defects in the product manufacturing process and the shape of the abnormal pattern.