MASKLESS EXPOSURE METHOD AND MASKLESS EXPOSURE DEVICE FOR PERFORMING THE EXPOSURE METHOD

摘要

A maskless exposure apparatus includes a stage on which a substrate is disposed, an optical head exposing the substrate, and a light source unit providing light to the optical head. The optical head exposes the substrate using an average focus distance, and the average focus distance divides the substrate into a plurality of regions, measures the best focus distance of each region, and averages the best focus distances of each region. is determined by