SICILON CARBIDE DIODE HAVING HIGH SURGE CURRENT CAPABILITY AND MANUFACTURING METHOD THEREOF

摘要

A silicon carbide diode having a high surge current capability, and including a semiconductor base plate. The semiconductor base plate includes an N-type silicon carbide substrate and an N-type silicon carbide epitaxial layer located on the N-type silicon carbide substrate. The upper portion of the N-type silicon carbide epitaxial layer is provided with a plurality of P-type well regions. The N-type high resistance region is provided under the P-type well region or on the lower surface of the P-type well region. The resistivity of the N-type high resistance region is greater than the resistivity of the N-type silicon carbide epitaxial layer. The N-type high resistance region is provided under the P-type well region, and a plurality of grooves are provided in the P-type well region or a plurality of block-shaped P-type regions uniformly arranged at intervals are provided in the N-type high resistance region.