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CONFORMAL MICRO- OR NANOPATTERNED NANOIMPRINT LITHOGRAPHY MASTER AND METHODS OF MAKING AND USING THE SAME
CONFORMAL MICRO- OR NANOPATTERNED NANOIMPRINT LITHOGRAPHY MASTER AND METHODS OF MAKING AND USING THE SAME
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机译:保形微型或纳米透明型纳米压印光刻母版和制造和使用方法
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摘要
A conformal micro- or nanopatterned nanoimprint lithography (NIL) master and methods of making and using same is disclosed. A conformal foil or film master with a patterned surface is provided for imprinting a substantially uniform pattern on a non-flat substrate. The conformal foil or film master may be mounted to a soft backing, which may be mounted to a rigid backing, to form conformal master structure. When pressed against a non-flat substrate, the conformal foil or film master substantially conforms to the contours and/or topology of the non-flat substrate to provide a substantially uniform pattern thereon.
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