首页> 外国专利> 2 2 2 ATOMIC LAYER-BASED SURFACE TREATMENT DEVICE FOR TWO-DIMENSIONAL MATERIALS METHOD FOR SURFACE TREATMENT OF TWO-DIMENSIONAL MATERIALS USING THE SAMEAND SURFACE-TREATED TWO-DIMENSIONAL MATERIAL USING THE SAME

2 2 2 ATOMIC LAYER-BASED SURFACE TREATMENT DEVICE FOR TWO-DIMENSIONAL MATERIALS METHOD FOR SURFACE TREATMENT OF TWO-DIMENSIONAL MATERIALS USING THE SAMEAND SURFACE-TREATED TWO-DIMENSIONAL MATERIAL USING THE SAME

机译:2 2 2 2原子层基表面处理装置,用于二维材料的二维材料的表面处理,使用Sameand表面处理的二维材料使用相同

摘要

The present invention relates to a surface treatment device capable of treating the surface of a sample, which is a two-dimensional material, in an atomic layer unit. The surface treatment apparatus of the present invention includes a tube that is formed elongated in one direction; a plasma generator formed on the tube and including electrodes capable of generating a potential difference; and a sample holder in which a sample surface-treated by the plasma generated from the plasma generator is located in the tube, and is installed at or outside the boundary of an area occupied by the plasma generator in one direction.
机译:技术领域本发明涉及一种能够处理原子层单元中的样品表面的表面处理装置,其是二维材料。 本发明的表面处理装置包括在一个方向上形成的管。 形成在管上的等离子体发生器,包括能够产生电位差的电极; 和一种样品保持器,其中通过从等离子体发生器产生的等离子体的等离子体的样品处理在管中,并且在一个方向上安装在等离子体发生器的区域的边界处或外部。

著录项

  • 公开/公告号KR20210123981A

    专利类型

  • 公开/公告日2021-10-14

    原文格式PDF

  • 申请/专利权人 서울대학교산학협력단;

    申请/专利号KR20200109510

  • 发明设计人 이관형;이종영;

    申请日2020-08-28

  • 分类号B01J19/08;B01J19/18;H01L21/02;B82Y40;

  • 国家 KR

  • 入库时间 2022-08-24 21:42:45

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