EUV EUV Apparatus and method for measuring phase of EUVExtreme Ultraviolet Mask and method for fabricating EUV mask comprising the method

摘要

The technical idea of the present invention is to provide an EUV mask phase measuring apparatus and method capable of accurately measuring the EUV mask phase, and an EUV mask manufacturing method including the same. The EUV mask phase measuring device includes: an EUV light source that generates and outputs EUV (Extreme Ultraviolet) light; at least one mirror reflecting the EUV light and making it incident on an EUV mask to be measured; a mask stage on which the EUV mask is disposed; a detector that receives the EUV light reflected from the EUV mask to obtain a 2D image, and measures reflectivity and diffraction efficiency of the EUV mask; and a processor configured to calculate the phase of the EUV mask by using the reflectivity and diffraction efficiency of the EUV mask.