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Manufacturing method of SiC electronic device with reduced processing step and SiC electronic device

机译:具有减少处理步骤和SIC电子设备的SIC电子设备的制造方法

摘要

Problem to be solved: to provide an improved method for manufacturing an electronic device (50) based on SiC and an electronic device manufactured thereby.The method isPrepare substrate (53) of SiC;Forming a structural layer (52) of SiC on the front of the substrate;An active region having a role in generating and / or conducting current during the use period of the electronic device (50) is formed in the structural layer (52);A first electrical terminal (58) is formed on the structural layer (52);A titanium intermediate layer (72) is formed on the rear of the substrate;Heating the intermediate layer (72) by a laser beam (82) to generate local heating for the formation of an ohmic contact of titanium compounds;AndA second electrical terminal (57) of this electronic device is formed on the intermediate layerEach step is provided.Diagram
机译:要解决的问题:提供一种基于SiC和由此制造的电子设备的制造电子设备(50)的改进方法。方法是SiC的方法是衬底(53);在前面形成SiC的结构层(52) 基板;在构造层(52)中形成在电子设备(50)的使用周期期间在电子设备(50)的使用时段期间发挥作用的有源区;在结构层上形成第一电气端子(58) 层(52);在基板的后部形成钛中间层(72);通过激光束(82)加热中间层(72),以产生钛化合物的欧姆接触的局部加热; 提供了该电子设备的第二电气端子(57),形成在中间层步骤上.DiaGram

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