首页> 外国专利> FACETED MIRROR FOR A PROJECTION EXPOSURE SYSTEM AND PROJECTION EXPOSURE SYSTEM WITH THE CORRESPONDING FACETED MIRROR AND PROCEDURES FOR OPERATING THE SAME

FACETED MIRROR FOR A PROJECTION EXPOSURE SYSTEM AND PROJECTION EXPOSURE SYSTEM WITH THE CORRESPONDING FACETED MIRROR AND PROCEDURES FOR OPERATING THE SAME

机译:面位式镜,用于投影曝光系统和投影曝光系统,具有相应的刻面镜和操作的过程

摘要

The present invention relates to a facet mirror for a projection exposure system and a projection exposure system with a facet mirror with several mirror facets (21), each mirror facet (21) having a mirror body (33) with a mirror surface (34) and the facet mirror comprising at least one actuator (26) , wherein at least one mirror facet (21) can be deformed by actuating the actuator, and wherein the actuator (26) comprises at least one magnetorheological substance or a shape memory alloy or a bimetal, so that the mirror facet (21) can be deformed by a change in temperature or pressure or a change in a magnetic field is. The invention also relates to a method for operating a facet mirror or a projection exposure system.
机译:本发明涉及一种用于投射曝光系统的小平面镜和投影曝光系统,具有各个镜面(21)的小镜,每个镜面(21)具有镜面(34),具有镜面(34) 并且包括至少一个致动器(26)的小平面镜,其中至少一个镜面(21)可以通过致动致动器而变形,并且其中致动器(26)包括至少一个磁流变物质或形状记忆合金或形状 双金属,使得镜面(21)可以通过温度或压力的变化或磁场的变化而变形。 本发明还涉及一种用于操作小平面镜或投影曝光系统的方法。

著录项

  • 公开/公告号DE102020210771A1

    专利类型

  • 公开/公告日2021-08-19

    原文格式PDF

  • 申请/专利权人 CARL ZEISS SMT GMBH;

    申请/专利号DE202010210771

  • 申请日2020-08-26

  • 分类号G02B7/185;G02B26/08;G03F7/20;G02B7/198;G02B7/182;

  • 国家 DE

  • 入库时间 2022-08-24 20:42:22

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