PUPIL FACET MIRROR FOR A MICROLITHOGRAPHY PROJECTION EXPOSURE PLANT, AND A CORRESPONDING PROJECTION EXPOSURE PLANT, AND A METHOD OF OPERATING A PUPIL FACET MIRROR

摘要

The present invention relates to a pupil facet mirror for a microlithography projection exposure apparatus having a multiplicity of pupil facets (11, 11 ', 11 "), each pupil facet (11, 11', 11") having a mirror element (25), wherein at least one Pupillenfacette (11,11 ', 11 "), the mirror element (25) between at least two mirror positions is adjustable. Moreover, the invention relates to a corresponding projection exposure apparatus and a method for operating the same.