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Rapid metal oxide layer-specific photonic treatment using UV LED for fabrication of flexible perovskite structures

机译:使用UV LED的快速金属氧化物层专用光子处理,用于制造柔性钙钛矿结构

摘要

Methods of forming a perovskite-containing film comprising depositing one or more metal oxide layers onto a substrate; and irradiating each metal oxide layer with a UV LED light source after deposition to sinter and/or anneal a target metal oxide in the one or more metal oxide layers without damaging the underlying substrate or perovskite material. The LED light source can be selected to emit a narrow spectral width of pulsed radiation. The radiation emitted can consist essentially of wavelengths within 20 nm of the wavelength of maximum absorbance (λmax) of the target metal oxide, that is, wavelength from UV LED can be λmax±20 nm, to achieve layer-specific annealing and sintering of metal oxide charge transport layer. The target metal oxide can include tin oxide in the electron transport layer or nickel oxide in the hole transport layer. Perovskite-containing films formed from the methods described herein are also disclosed.
机译:形成含钙钛矿薄膜的方法,包括将一个或多个金属氧化物层沉积到基材上; 在沉积后用UV LED光源照射每个金属氧化物层,并在一个或多个金属氧化物层中退火靶金属氧化物,而不会损坏下面的基底或钙钛矿材料。 可以选择LED光源以发射脉冲辐射的窄光谱宽度。 发射的辐射可以基本上由目标金属氧化物的最大吸光度(λ<亚> Max )的波长内的20nm内的波长组成,即,来自UV LED的波长可以是λ max ±20nm,实现金属氧化物电荷转移层的层特异性退火和烧结。 目标金属氧化物可包括在空穴传输层中的电子传输层中的氧化锡或氧化镍。 还公开了由本文描述的方法形成的含钙钛矿的膜。

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