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SYSTEM AND METHOD FOR MEASURING DISTORTED ILLUMINATION PATTERNS AND CORRECTING IMAGE ARTIFACTS IN STRUCTURED ILLUMINATION IMAGING
SYSTEM AND METHOD FOR MEASURING DISTORTED ILLUMINATION PATTERNS AND CORRECTING IMAGE ARTIFACTS IN STRUCTURED ILLUMINATION IMAGING
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机译:用于测量扭曲照明模式的系统和方法和校正结构照明成像中的图像伪影
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摘要
A method for measuring distorted illumination patterns and correcting image artifacts in structured illumination microscopy. The method includes the steps of generating an illumination pattern by interfering multiple beams, modulating a scanning speed or an intensity of a scanning laser, or projecting a mask onto an object; taking multiple exposures of the object with the illumination pattern shifting in phase; and applying Fourier transform to the multiple exposures to produce multiple raw images. Thereafter, the multiple raw images are used to form and then solve a linear equation set to obtain multiple portions of a Fourier space image of the object. A circular 2-D low pass filter and a Fourier Transform are then applied to the portions. A pattern distortion phase map is calculated and then corrected by making a coefficient matrix of the linear equation set varying in phase, which is solved in the spatial domain.
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