Pattern forming method, actinic cheilitis or radiation-sensitive resin composition, actinic cheilitis or radiation-sensitive film, and method for manufacturing an electronic device.

摘要

Provided are: a pattern forming method which exhibits excellent roughness performance such as LWR and excellent EL; an active light sensitive or radiation sensitive resin composition; an active light sensitive or radiation sensitive film; and a method for manufacturing an electronic device. This pattern forming method comprises: a step 1 for forming a film with use of an active light sensitive or radiation sensitive resin composition that contains a resin A having an acid group and an acid-decomposable group which produces an acid group when decomposed by the action of an acid, a photoacid generator B, a basic compound C and a compound D which produces an acid when decomposed by the action of light or an acid produced from the photoacid generator B; a step 2 for exposing the film to light; and a step 3 for forming a pattern by developing the light-exposed film with use of a developer liquid that contains an organic solvent. The basic compound C has a degree of basicity enough for neutralizing the acid group of the resin A; and the acid produced from the compound D has a weaker acidity than the acid produced from the photoacid generator B.