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THROUGH HOLE FILLING AND PLATING METHOD APPLIED TO OPTICAL MODULE HIGH DENSITY INTERCONNECT HDI BOARD

机译:通过孔填充和电镀方法应用于光学模块高密度互连HDI板

摘要

A through hole filling and plating method applied to an optical module high density interconnect (HDI) board, comprising sequentially performing copper reduction, forward and reverse drilling, trepanning drilling, degumming copper precipitation, first time exposure development, through hole electroplating, film stripping, plate grinding, second time exposure development, and hole filling and electroplating. In the through hole filling and plating method applied to an optical module HDI board, drilling is performed twice so that the cross section of the through hole appears to be a stepped shape the center portion of which is small and the two ends of which are large, and the two drilling steps match the two hole filling steps for the center portion and two ends of the through hole respectively, thereby implementing the step-by-step filling and plating of the through hole. Thus, the phenomenon of core covering is prevented from occurring during the filling and plating process, and the signal transmission stability of a circuit board is effectively improved.
机译:一种通孔填充和电镀方法应用于光学模块高密度互连(HDI)板,包括顺序执行铜减速,前进和反向钻孔,沿着钻孔,脱胶铜沉淀,首次曝光开发,通过孔电镀,薄膜剥离,板式研磨,第二次曝光开发和孔填充和电镀。在应用于光学模块HDI板的通​​孔填充和电镀方法中,钻孔两次,使得通孔的横截面似乎是阶梯形状,其中心部分很小,其两端很大并且,两个钻孔步骤分别匹配中心部分的两个孔填充步骤和通孔的两端,从而实现通孔的逐步填充和电镀。因此,在填充和电镀过程中防止了芯覆盖物的现象,并且有效地提高了电路板的信号传输稳定性。

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