METHOD OF DETERMINING INFORMATION ABOUT A PATTERNING PROCESS, METHOD OF REDUCING ERROR IN MEASUREMENT DATA, METHOD OF CALIBRATING A METROLOGY PROCESS, METHOD OF SELECTING METROLOGY TARGETS

摘要

A method of selecting a recipe is provided, comprising: obtaining measurements from a metrology target positioned on a semiconductor wafer, acquiring measurements from a target in a device positioned on a semiconductor wafer, using both metrology target measurements and in-device metrology measurements and determining a recipe for accurate measurement.