首页> 外国专利> Bulk acoustic wave filter and a method of frequency tuning for bulk acoustic wave resonator of bulk acoustic wave filter

Bulk acoustic wave filter and a method of frequency tuning for bulk acoustic wave resonator of bulk acoustic wave filter

机译:散装声波滤波器和散装声波滤波器散装声波谐振器的频率调谐方法

摘要

A method for forming cavity of bulk acoustic wave resonator comprising following steps of: forming a sacrificial epitaxial structure mesa on a compound semiconductor substrate; forming an insulating layer on the sacrificial epitaxial structure mesa and the compound semiconductor substrate; polishing the insulating layer by a chemical-mechanical planarization process to form a polished surface; forming a bulk acoustic wave resonance structure on the polished surface, which comprises following steps of: forming a bottom electrode layer on the polished surface; forming a piezoelectric layer on the bottom electrode layer; and forming a top electrode layer on the piezoelectric layer, wherein the bulk acoustic wave resonance structure is located above the sacrificial epitaxial structure mesa; and etching the sacrificial epitaxial structure mesa to form a cavity, wherein the cavity is located under the bulk acoustic wave resonance structure.
机译:一种形成体声波谐振器空腔的方法,包括以下步骤:在化合物半导体衬底上形成牺牲外延结构台面;在牺牲外延结构台面和化合物半导体衬底上形成绝缘层;通过化学机械平坦化方法抛光绝缘层以形成抛光表面;在抛光表面上形成散装声波共振结构,其包括以下步骤:在抛光表面上形成底部电极层;在底部电极层上形成压电层;在压电层上形成顶部电极层,其中散装声波谐振结构位于牺牲外延结构台面上方;并蚀刻牺牲外延结构台面以形成腔,其中腔位于散装声波共振结构下方。

著录项

  • 公开/公告号US11070185B2

    专利类型

  • 公开/公告日2021-07-20

    原文格式PDF

  • 申请/专利权人 WIN SEMICONDUCTORS CORP.;

    申请/专利号US202016779982

  • 发明设计人 CHIA-TA CHANG;CHUN-JU WEI;KUO-LUNG WENG;

    申请日2020-02-03

  • 分类号H03H3/02;H03H9/58;H03H3/04;

  • 国家 US

  • 入库时间 2024-06-14 21:48:44

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