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AZIMUTHAL SENSOR ARRAY FOR RADIO FREQUENCY PLASMA-BASED WAFER PROCESSING SYSTEMS
AZIMUTHAL SENSOR ARRAY FOR RADIO FREQUENCY PLASMA-BASED WAFER PROCESSING SYSTEMS
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机译:用于射频等离子体的基于射频等离子体的晶片处理系统的方位传感器阵列
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摘要
A radio frequency plasma processing system including a reaction chamber having an approximate chamber symmetry axis, a first plasma powering device, and a plurality of azimuthally disposed broadband electromagnetic sensors located approximately equidistant from the chamber symmetry axis to measure electromagnetic behavior about the reaction chamber during a radio frequency plasma process.
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