首页>
外国专利>
MASK, MASK ASSEMBLY, EXPOSURE MACHINE, METHOD FOR TESTING SHADOWING EFFECT ON WINDOW, AND PHOTOLITHOGRAPHY METHOD
MASK, MASK ASSEMBLY, EXPOSURE MACHINE, METHOD FOR TESTING SHADOWING EFFECT ON WINDOW, AND PHOTOLITHOGRAPHY METHOD
展开▼
机译:面具,面罩组件,曝光机,用于测试窗口阴影效果的方法,以及光刻法
展开▼
页面导航
摘要
著录项
相似文献
摘要
A mask, a mask assembly, an exposure machine, a method for testing shadowing effect on a window, and a photolithography method are provided. The mask includes a light transmission area; a functional window provided at a side of the light transmission area; and at least one of a first detection mark and a second detection mark; wherein the first detection mark is flushed with a border of the functional window adjacent to an interior of the mask; and the second detection mark is disposed between the profile of the light transmission area and the functional window.
展开▼