RAPID LARGE-SCALE FABRICATION OF METASURFACES WITH COMPLEX UNIT CELLS

摘要

A method of fabricating a metasurface comprises coating a photoresist film onto a substrate and loading the coated substrate into a laser interference lithography setup, exposing the photoresist film via a laser with a first interference pattern, the first interference pattern having a first period and a first exposure energy, subsequently exposing the coated substrate with a second interference pattern, the second interference pattern having a second period and a second exposure energy, developing the exposed portions of the photoresist film to form a periodic pattern in the photoresist, and transferring the periodic pattern into the substrate, the substrate supporting an appropriate film system that embodies the final metasurface device.