A method for cleaning a vacuum system, a method for vacuum processing of a substrate, and an apparatus for vacuum processing a substrate

摘要

A method for cleaning a vacuum chamber, in particular a vacuum chamber used in the manufacture of OLED devices, is described. The method includes cleaning at least one of a surface of the vacuum chamber and a component within the vacuum chamber with an active species, wherein the process gas for generating the active species comprises at least 90% oxygen and at least 2% argon; , in particular the process gas contains about 95% oxygen and about 5% argon.