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Method of manufacturing partially freestanding two-dimensional crystal film and device comprising such a film
Method of manufacturing partially freestanding two-dimensional crystal film and device comprising such a film
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机译:制造部分独立式二维晶体膜的方法和包括这种膜的装置
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摘要
Disclosed is a method of manufacturing a partially freestanding two-dimensional crystal film (16, 16′), the method comprising providing a substrate (10) carrying a catalyst layer (14) for forming the two-dimensional crystal layer on a first surface; forming the two-dimensional crystal film on the catalyst layer; covering at least the two-dimensional crystal film with a protective layer (18); etching a cavity (24) in a second surface of the substrate, the second surface being opposite to the first surface, said cavity terminating on the catalyst layer; etching the exposed part of the catalyst layer from the cavity; and removing the protective layer, thereby obtaining a two-dimensional crystal film that is freestanding over said cavity. A device manufactured in this manner is also disclosed.
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