Increasing production capacity of plasma assisted chemical vapor deposition device

摘要

The plasma assisted chemical vapor deposition device is located on the substrate in the engine room, including a deposition shell (2), a robot (R) for loading the substrate into the engine room and unloading the substrate from the engine room, and three engine rooms (4.1, 4.2, 4.3),Three loading and unloading arms, each of which can rotate around the vertical axis (z) and translate vertically,Each loading arm is configured to introduce and remove one pod (4.1, 4.2, 4.3) from the shell (2) of the storage area (ZD), and place each pod in the storage area (ZS) and the loading area, storage area (ZD),The storage (ZS) and the loading (ZC) are arranged around the rotation axis (z),When another nacelle is removed from the housing (2) by another loading arm, the loading arm is configured to introduce one of the nacelles into the housing (2) through one loading arm.Abstract figure: 1