Substrate support with real time force and film stress control

摘要

Embodiments disclosed herein include a substrate support having a sensor assembly and a processing chamber having a sensor assembly. In one embodiment, the substrate support has a pack. The pack has a workpiece support surface and gas holes exiting the workpiece support surface. A sensor assembly is disposed within the gas hole and configured to detect a metric indicative of deflection of the workpiece disposed on the workpiece support surface, the sensor assembly being positioned within the gas hole when A gas is configured to flow past the sensor assembly.