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SUBSTRATE SURFACE MODIFIER FOR ATOMIC LAYER DEPOSITION AND VAPOR DEPOSITION, AND METHOD FOR MODIFYING SURFACE OF SUBSTRATE USING SAME
SUBSTRATE SURFACE MODIFIER FOR ATOMIC LAYER DEPOSITION AND VAPOR DEPOSITION, AND METHOD FOR MODIFYING SURFACE OF SUBSTRATE USING SAME
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机译:用于原子层沉积和气相沉积的基板表面改性剂,以及使用该原料改变基板表面的方法
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摘要
Disclosed are a surface modifier for uniformly modifying the surface of a substrate such as an inorganic thin film by means of atomic layer deposition or vapor deposition, and a method, for modifying the surface of a substrate, using same.
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