How to optimize Metro logic processes

摘要

Discloses a method for optimizing Metro logic processes.In one configuration, measurement data is obtained from multiple applications of the Metro logic process to the first target on the substrate.Each application of the metrology process includes illuminating a first target at a radiation spot and detecting radiation redirected by a first target.The application of the metrology process includes the application of one or more of the radiation spots to the first target, and (b) in one or both of the plurality of focal heights of the radiation spot.The measurement data includes the detected pupil representation of optical features of the re induced radiation in the pupil plane for each application of the metrology process.The method includes determining one or both of the optimal alignment and the optimal focal height based on the comparison between the detected pupil representation and the reference pupil representation of the measurement data.Selection diagram