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Preparation of Layered MXene via Elemental Halogen Etching of MAX Phase

机译:通过最大相位的元素卤素蚀刻制备层状mxENE

摘要

A method of making a layered MXene material comprises a) introducing dried MAX phase powder into a vessel under anhydrous, inert conditions, the MAX phase powder comprising a general formula of Mn+1AXn (n=1, 2, 3, or 4), wherein M is a transition metal or p-block metalloid selected from the group consisting of Ti, Zr, Hf, V, Nb, Ta, Cr, Mo, W, Re, Cu, Ni, Ag, Zn, Cd, In, Sn, and Pb; interlayer A is a Group III, IV, or V metalloid selected from the group consisting of Al, Si, Ga, Ge, In, Sn, Pb, As, Bi, Sb, and X is one of C (carbon) and N (nitrogen); b) introducing a halogen and solvent to the dried MAX phase to create a halogen solution having a predetermined concentration; c) allowing a reaction to proceed for about 24 hours between 30-90° C. to create a reaction slurry comprising a MXene material.
机译:一种制备层状mxEne材料的方法包括在无水的惰性条件下将干燥的最大相粉末引入容器中,所述最大相粉末包括M N + 1 AX N的通式(n = 1,2,3或4),其中m是选自Ti,Zr,Hf,V,Nb,Ta,Cr,Mo的过渡金属或p-嵌段金属, W,Re,Cu,Ni,Ag,Zn,Cd,In,Sn和Pb;中间层A是选自Al,Si,Ga,Ge,IN,Sn,Pb,Bi,Sb,x的基团III,IV或v金属族,X是C(碳)和N中的一种(氮); b)将卤素和溶剂引入干燥的最大相以产生具有预定浓度的卤素溶液; c)允许反应在30-90℃之间进行约24小时以产生包含偏黄材料的反应浆料。

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