METHOD FOR FORMING A CHEMICAL GUIDING STRUCTURE ON A SUBSTRATE AND CHEMO-EPITAXY METHOD

摘要

One aspect of the present invention relates to a method of forming a chemical guiding structure intended for self-assembly of organic nano-objects by chemo-epitaxy, the method comprising the following steps: -On the substrate 100, forming a sacrificial pattern 300 having a critical dimension (CD S ) in a plane flat with the substrate 100; -On the substrate 100, between the sacrificial patterns 300, forming at least one first pattern 210a made of a first polymer material, wherein the first polymer material is an organic nano-object Has a first chemical affinity (AF1); -Reducing the critical dimension (CD S ) of the sacrificial pattern by partially etching (S13) the sacrificial pattern 300, wherein the sacrificial pattern 300 is the at least one first Selectively etched for pattern 210a; -Forming a second pattern made of a second polymer material on the substrate 100, in the region 100b created by partial etching of the sacrificial pattern 300, wherein the second polymer material is a first Has a second chemical affinity for the organic nano-object, different from the chemical affinity (AF1); And -Including the step of removing the sacrificial pattern (300).