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METHOD FOR FORMING A CHEMICAL GUIDING STRUCTURE ON A SUBSTRATE AND CHEMO-EPITAXY METHOD

机译:在基板和化学外延法上形成化学引导结构的方法

摘要

A method for forming a chemical guiding structure for self-assembling organic nano-objects by chemo-epitaxy, the method including forming on a substrate sacrificial patterns having a critical dimension in a plane parallel to the substrate; forming on the substrate, between the sacrificial patterns, a first pattern made of a first polymer material, the first polymer material having a first chemical affinity with respect to the organic nano-objects; partially etching the sacrificial patterns so as to reduce the critical dimension of the sacrificial patterns, the sacrificial patterns being etched selectively with respect to said first pattern using a first wet etching method; forming on the substrate, in areas created by the partial etching of the sacrificial patterns, second patterns made of a second polymer material, the second polymer material having a second chemical affinity with respect to the organic nano-objects, different from the first chemical affinity; and removing the sacrificial patterns.
机译:一种通过化学外延形成自组装有机纳米物体的化学引导结构的方法,该方法包括在平行于基板的平面中具有临界尺寸的基板牺牲图案的方法;在基板上形成牺牲图案,由第一聚合物材料制成的第一图案,第一聚合物材料相对于有机纳米物体具有第一化学亲和力;部分地蚀刻牺牲图案以减小牺牲图案的临界尺寸,使用第一湿法蚀刻方法选择性地相对于所述第一图案选择性地蚀刻牺牲图案;在基板上形成,在由牺牲图案的部分蚀刻产生的区域中,由第二聚合物材料制成的第二图案,第二聚合物材料相对于有机纳米物体具有第二化学亲和力,与第一种化学亲和力不同;并去除牺牲模式。

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